To address the urgent issue of how to manage process variability in the early stages of design creation, Mentor Graphics Corp. today announced its production-proven Calibre Litho-Friendly Design (LPD) ...
NVIDIA’s cuLitho software library for computational lithography is being integrated by TSMC, ASML and into their software, manufacturing processes and systems for NVIDIA’s Hopper architecture GPUs. “ ...
ALLENTOWN, Pa. — TEA Systems Corp. introduced Weir PW, a software suite for process control in lithography applications. Using custom models for wafer and field systematic applications, the software ...
Nvidia has developed a software library for computational lithography, which it believes will massively improve chip design development times, and reduce the number of data centers chip fabs have to ...
Several packaging houses are inching closer to production of panel-level fan-out packaging, a next-generation technology that promises to reduce the cost of today’s fan-out packages. In fact, ASE, ...
Continued scaling of integrated circuits to smaller dimensions is still a viable way to increase compute power, achieve higher memory cell density, or reduce power consumption. These days, chip makers ...
Record number of papers at SPIE Advanced Lithography reports imec's progress in advanced lithography
(Nanowerk News) At next week’s SPIE Advanced Lithography Conference, to be held February 22 - 26 in San Jose, California, imec technologists contribute in a record number of over 30 papers showing ...
Over the past few years we’ve seen several impressive projects where people try to manufacture integrated circuits using hobbyist tools. One of the most complex parts of this process is lithography: ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results
Feedback